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GASGUARD Active Control Phase 1 Our GASGUARD® Active Phase I technology now allows semiconductor fabs to achieve much greater precision in controlling the pressure of high vapor pressure gases such as dopant gases, purge gases and high-pressure halocarbons (NF3, silane, N2O, CO2, CF4, etc.) during delivery to the tool, with zero drift. Maintain, repeat and stabilize pressure for high vapor pressure gases under varying manufacturing…

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Nitrogen Trifluoride NG Nitrogen Trifluoride NG (NF3) is used in silicon semiconductor process applications.

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Nitrogen Trifluoride VLSI Nitrogen Trifluoride (NF3) is used in silicon semiconductor process applications.

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