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Deposition - Page 2

Tetraethyl Orthosilicate TEOS Tetraethyl Orthosilicate (TEOS) is used as a semiconductor silicon source for the Thin Film Deposition of doped and undoped silicon dioxide films. It is used as a replacement for silane and other pyrophoric silicon sources.

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Tetrakis Dimethylamino Titanium TDMAT Tetrakis-dimethylamino Titanium (TDMAT) is a liquid chemical source suitable for the chemical vapor deposition of titanium nitride films. TiN films are effective diffusion barriers for IC applications.

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Tetramethylcyclotetrasiloxane TOMCATS Tetramethylcyclotetrasiloxane (TOMCATS) is used as a silicon source for the chemical vapor Thin Film Deposition (CVD) of high quality low dielectric constant films and silicon dioxide films.

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Tetramethylsilane 4MS EXTREMA Tetramethylsilane (4MS) is a precursor for depositing carbon doped silicon films and silicon carbide-like films.

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Titanium Precursors We offer Titanium Precursors for Thin Film Deposition of High K and Ultra High K dielectric films. These closely related compounds allow you to tailor the precursor to suit your processing requirements by selecting for properties such as Thin Film Deposition temperature, Thin Film Deposition rate, vapor pressure, etc. These precursors represent a technological advance over conventional precursors, such as…

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Titanium Tetrachloride TiCl4 Titanium Tetrachloride (TiCl4) is a liquid source material for the chemical vapor Thin Film Deposition (CVD) of titanium nitride, titanium dioxide and titanium metal.

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Trichlorosilane Megabit Trichlorosilane TCS Megabit™ Grade is our standard high purity grade. Trichlorosilane is used in silicon semiconductor thin film deposition applications.

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Pentakis Dimethylamino Tantalum PDMAT Pentakis-dimethylamino Tantalum (PDMAT) is a solid source material for chemical vapor deposition or atomic layer deposition of highly conformal tantalum oxide or tantalum nitride films.

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Phosphine MOCVD We offer Phosphine (PH3) in two grades for use in semiconductor and photovoltaic process applications: MOCVD Phosphine (>99.9998%) is our standard high-purity grade and Megabit™ II Phosphine (99.9999%) is our standard purity grade. Phosphine is a highly-toxic, flammable, colorless, liquefied compressed gas.

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Propylene Electronic Propylene (C3H6) is a gas used for building up the Amorphous Carbon Layer (ACL), which works as a hardmask to support photoresist in the etching process.

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