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Deposition - Page 3

Phosphine MOCVD Versum Materials offers Phosphine (PH3) in two grades for use in semiconductor and photovoltaic process applications: MOCVD Phosphine (>99.9998%) is our standard high-purity grade and Megabit II Phosphine (99.9999%) is our standard purity grade. Phosphine is a highly-toxic, flammable, colorless, liquefied compressed gas.

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Propylene Electronic Propylene (C3H6) is a gas used for building up the Amorphous Carbon Layer (ACL), which works as a hardmask to support photoresist in the etching process.

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Hafnium Tetrachloride Hafnium tetrachloride (HfCl4) is a solid source material for the atomic layer Thin Film Deposition (ALD) of hafnium oxide films.

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Germane Germane (GeH4) is a gas used for depositing the SiGe layer, which provides improved electric properties.

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Germane Hydrogen Mixture 10% 10% ±0.2% Germane (GeH4) in Hydrogen (H2) Mixture is used in semiconductor thin film deposition applications.

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Germaninum Antimony Tellurium Precursors Versum Materials offers a series of advanced Germanium (Ge), Antimony (Sb) and Tellurium (Te) precursors for Thin Film Deposition of phase changing alloys such as GST. These precursors are volatile liquids which are suitable for direct evaporation at modest temperatures.

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GST Precursors Versum Materials offers a series of advanced Germanium (Ge), Antimony (Sb) and Tellurium (Te) precursors for Thin Film Deposition of phase changing alloys such as GST. These precursors are volatile liquids which are suitable for direct evaporation at modest temperatures.

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Diethoxymethylsilane (DEMS) Precursor Diethoxymethylsilane (DEMS®) is used as a silicon source for the chemical vapor deposition of high quality low constant films and silicon dioxide films. When used in the PDEMS® ILD process, it can be used to deposit ultra-low k films with k -2.5 and below.

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GASGUARD Gas Delivery Systems Our GASGUARD® product line includes automatic, semi-automatic and manual systems in a variety of configurations, from a single-source system to a three-cylinder source system and purge system. The different models can accommodate a full range of hazardous gases: flammable, pyrophoric, corrosives, toxics and highly-toxics, all tailored to meet your needs.

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CHEMGUARD® GEN III BCD 100-200 Bulk Automated Chemical Delivery Systems The CHEMGUARD Gen III BCD 100 and 200 chemical delivery systems are single-reservoir bulk cabinets designed for fabwide distribution allowing 100% tool uptime. Class I, Division II compliant, the BCD is designed for difficult chemistries in difficult environments. Versum Materials' patented ultrasonic technology lets you completely empty the reservoir to help eliminate expensive chemical waste. Years of experience goes into all of our high purity chemical delivery…

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