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Doping

PH3 Phosphine ION‐X® Dopant Gas Storage and Delivery System Versum Materials and NuMat Technologies announce a global alliance to bring ION‐X sub‐atmospheric dopant gas storage and delivery system solutions to our worldwide customers. ION-X  is used for the safe storage and delivery of sub-atmospheric dopant gases such as arsine, phosphine and boron trifluoride. With its Metal-Organic Framework (MOF), ION-X can selectively adsorb, store and safely deliver ultra-high purity gases at…

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Isotopically‐Enriched BF3 (Boron Trifluoride) ION‐X® Dopant Gas Storage and Delivery System Versum Materials and NuMat Technologies announce a global alliance to bring ION‐X sub‐atmospheric dopant gas storage and delivery system solutions to our worldwide customers. ION-X  is used for the safe storage and delivery of sub-atmospheric dopant gases such as arsine, phosphine and boron trifluoride. With its Metal-Organic Framework (MOF), ION-X can selectively adsorb, store and safely deliver ultra-high purity gases at…

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AsH3 (Arsine) ION-X® Dopant Gas Storage and Delivery System Versum Materials and NuMat Technologies announce a global alliance to bring ION-X sub‐atmospheric gas storage and delivery system solutions to our worldwide customers.

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Trimethylphosphate Trimethylphosphate (TMPO) is a liquid phosphorus source used in depositing PSG and BPSG films for semiconductor applications. TMPO is a high purity liquid precursor used in producing high quality dielectric films.

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Trimethylphosphite Trimethylphosphite (TMPI) is a liquid phosphorus source used with silicon sources such as TEOS to dope SiO2 in PSG and BPSG applications.

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Triethylborate Triethylborate (TEB) is a liquid boron source used for Borosilicate (BSG) and Borophosphosilicate (BPSG) glass Thin Film Deposition in low pressure, atmospheric pressure and plasma enhanced CVD systems

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Triethylphosphate Triethylphosphate (TEPO) is a liquid phosphorus source used in depositing PSG and BPSG films for semiconductor applications.

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Trimethylborate Trimethylborate (TMB) is used as a liquid boron dopant in the Thin Film Deposition of Borosilicate (BSG) and Borophosphosilicate (BPSG) glasses to reduce the reflow temperatures of the deposited glass.

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Phosphine in Hydrogen Mixture Versum Materials offers Phosphine (PH3) in Hydrogen mixtures.

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Phosphine Megabit II Versum Materials offers Phosphine (PH3) in two grades for use in semiconductor and photovoltaic process applications: MOCVD Phosphine (>99.9998%) is our standard high-purity grade and MegabitII Phosphine (99.9999%) is our standard purity grade. Phosphine is a highly-toxic, flammable, colorless, liquefied compressed gas.

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