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Etching - Page 2

Nitrogen Trifluoride VLSI Nitrogen Trifluoride (NF3) is used in silicon semiconductor process applications.

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Octafluorocyclobutane VLSI Octofluorocyclobutane (C4F8) (99.999%) is a colorless, odorless, non-flammable liquefied, high purity gas used in semiconductor applications. VLSI Grade (99.999%) is our highest purity grade.

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Hexafluorobutadiene nCtrl Hexafluoro-1,3-butadiene (C4F6) is used for dielectric etch applications. Hexafluoro-1,3-butadiene is a toxic, colorless, odorless, flammable liquefied compressed gas.

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Hexafluorobutadiene VLSI Hexafluoro-1,3-butadiene (C4F6) is used for dielectric etch applications. Hexafluoro-1,3-butadiene is a toxic, colorless, odorless, flammable liquefied compressed gas.

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Hexafluoroethane Halocarbon 116 Hexafluoroethane (C2F6), also known as Halocarbon 116, is our highest purity offering for semiconductor and MEMS etching applications and MEMS chamber cleaning applications. Halocarbon 116 is a colorless, odorless, liquefied gas.

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Hydrogen Chloride VLSI Hydrogen Chloride (HCl) is used in various surface cleaning processes and to clean LPCVD chambers.

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Chlorine Trifluoride SEMI Chlorine Trifluoride (ClF3) is a nearly colorless gas with an irritating odor similar to chlorine or mustard with an extremely low odor threshold. Our Semiconductor Grade (>99.9% purity) is sold in all regions except Taiwan

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Chlorine Trifluoride VLSI Chlorine Trifluoride (ClF3) is a nearly colorless gas with an irritating odor similar to chlorine or mustard with an extremely low odor threshold.

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Carbon Tetrafluoride VLSI Carbon Tetrafluoride (CF4) is used for chamber cleaning in semiconductor applications, in MEMS etching applications, and in Flat Panel Display etching applications.

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Anhydrous Hydrogen Chloride (HCl) Anhydrous Hydrogen Chloride (HCl) is used for etching processes in semiconductor applications.

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