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High-K

Strontium Precursors Versum Materials offers a series of Strontium (Sr) precursors for Thin Film Deposition of Ultra High K STO (Strontium Titanate) films. These precursors comprise both pure compounds for direct evaporation and formulated mixtures for direct liquid injection through a suitable vaporizer.

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Tellurium Precursors Versum Materials offers a series of advanced Germanium (Ge), Antimony (Sb) and Tellurium (Te) precursors for Thin Film Deposition of phase changing alloys such as GST. These precursors are volatile liquids which are suitable for direct evaporation at modest temperatures.

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Lanthanide Precursors Lanthanide (La) oxide is used in the High K dielectrics process as capping layers on other High K films, such as HfO2, or as stabilizers of crystalline forms of High K dielectrics, such as ZrO2.

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GASGUARD Gas Delivery Systems Our GASGUARD® product line includes automatic, semi-automatic and manual systems in a variety of configurations, from a single-source system to a three-cylinder source system and purge system. The different models can accommodate a full range of hazardous gases: flammable, pyrophoric, corrosives, toxics and highly-toxics, all tailored to meet your needs.

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CHEMGUARD® GEN III BCD 100-200 Bulk Automated Chemical Delivery Systems The CHEMGUARD Gen III BCD 100 and 200 chemical delivery systems are single-reservoir bulk cabinets designed for fabwide distribution allowing 100% tool uptime. Class I, Division II compliant, the BCD is designed for difficult chemistries in difficult environments. Versum Materials' patented ultrasonic technology lets you completely empty the reservoir to help eliminate expensive chemical waste. Years of experience goes into all of our high purity chemical delivery…

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