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Low-K

Trimethylsilane 3MS Semiconductor Semiconductor Grade Trimethylsilane (99.995%) is our standard high-purity offering for Low-k semiconductor applications. Trimethylsilane is a colorless, odorless, and highly-flammable gas.

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Tetramethylsilane 4MS EXTREMA Tetramethylsilane (4MS) is a precursor for depositing carbon doped silicon films and silicon carbide-like films.

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Tetramethylcyclotetrasiloxane TOMCATS Tetramethylcyclotetrasiloxane (TOMCATS) is used as a silicon source for the chemical vapor Thin Film Deposition (CVD) of high quality low dielectric constant films and silicon dioxide films.

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Porous Diethyoxymethylsilane (PDEMS) Precursor Porous Diethyoxymethylsilane (PDEMS®) is an organosilicate glass used for ultra-low dielectric constant films for intermetal dielectric applications.

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Diethoxymethylsilane (DEMS) Precursor Diethoxymethylsilane (DEMS®) is used as a silicon source for the chemical vapor deposition of high quality low constant films and silicon dioxide films. When used in the PDEMS® ILD process, it can be used to deposit ultra-low k films with k -2.5 and below.

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GASGUARD Gas Delivery Systems Our GASGUARD® product line includes automatic, semi-automatic and manual systems in a variety of configurations, from a single-source system to a three-cylinder source system and purge system. The different models can accommodate a full range of hazardous gases: flammable, pyrophoric, corrosives, toxics and highly-toxics, all tailored to meet your needs.

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