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Sponsor - Jul 21, 2019
2019 Annual Conference on Atomic Layer Deposition (ALD)
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Visit us at ALD 2019 to hear from our technology team on the following topics:

Invited Presentation: Grand Ballroom E-G, Monday, July 22, 2019, 1:30 pm

The Materials Supplier Challenge: Flawless Execution from Precursor Design to High Volume Manufacturing
Madhukar B. Rao, Versum Materials


Poster Sessions: Evergreen Ballroom & Foyer, Monday, July 22, 5:45 pm

Atomic Layer Deposition of Molybdenum Films from Molybdenum Pentachloride Precursor
Changwon Lee, Se-Won Lee, Moo-Sung Kim, Sergei Ivanov; Versum Materials

Atomic Layer Deposition of Carbon Doped Silicon Oxide and Effect of Thermal Treatment or Hydrogen Plasma Treatment on the Films
Meilang Wang, Haripin Chandra, Xinjian Lei, Anu Mallikarjuan, Kirk Cuthill, Manchao Xiao, Ron Pearlstein, Madhukar Rao; Versum Materials

Atomic Layer Deposition of Magnesium Oxide Thin Films by Using Bis(ethylcyclopentadienyl)Magnesium Precursor and H2O2, O2 Plasma and O3 Reactants
Moo-Sung Kim, Se-Won Lee, Sergei Ivanov; Versum Materials

Plasma Enhanced Atomic Layer Deposition of Silicon Nitride Thin Film by Organosilane Precursor and Process Engineering
Se-Won Lee, Changwon Lee, Moo-Sung Kim, Sang Yi, Xinjian Lei; Versum Materials

  • Date: July 21 - 25, 2019
  • Time: 8:00 am - 6:00 pm
  • Location: Hyatt Regency Bellevue
  • Address: 900 Bellevue Way NE, Bellevue, WA 98004, United States
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