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Versum’s Ridgeway to Discuss Porous Low-k Precursor at SEMICON Taiwan IC Forum LEHIGH VALLEY, Pa. (September 8, 2016) – Dr. Bob Ridgeway, group leader for PECVD and FCVD Applications at Versum Materials, will deliver a presentation at the IC Forum of SEMICON Taiwan on September 9, 2016, entitled, “Development of a Porous low-k Precursor to Provide Enhanced Mechanical Properties without Sacrificing Carbon Content.” Scheduled for 3:10 p.m., in Room 401 of Hall…

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