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Advanced Titanium PrecursorsVersum Materials offers a series of advanced Ti precursors for Thin Film Deposition of High K and Ultra High K dielectric films. These closely related compounds allow you to tailor the precursor to suit your processing requirements by selecting for properties such as Thin Film Deposition temperature, Thin Film Deposition rate, vapor pressure, etc. These precursors represent a technological advance…

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ACT 940ACT® 940 etch residue remover and positive photoresist is a highly effective hydroxylamine (HA) based product for aluminum clean applications. It is extremely successful in removing etch residue while protecting exposed aluminum, titanium and tungsten.  It is well adopted by worldwide semiconductor foundries.

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ACT 970ACT® 970 etch residue remover and positive photoresist stripper is an extremely effective amine‐based product for aluminum and copper applications.

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ACT 970TACT® 970T etch residue remover and positive photoresist stripper is effective in removing refractory etch residue while protecting exposed copper. It was designed specifically for use on substrates where copper corrosion is of concern.

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ACT 412ACT® 412 positive photoresist stripper is specially formulated for the effective removal of positive photoresist from Group III‐V compounds and metal alloy substrates.

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ACT 690SACT® 690S etch residue remover and positive photoresist stripper is a solvent‐based product for stripping severely processed photoresist films and etch residues.

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ACT 690SXACT® 690SX is an organic solvent-based blend that is very effective in removing severely processed photoresist films and etch residue over corrosive sensitive metals and alloys.

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ACT 927CACT® 927C etch residue remover is a highly effective hydroxylamine (HA) product for aluminum clean applications. It is extremely (HA) product for aluminum clean applications. It is extremely successful in removing refractory etch residue while protecting exposed aluminum, titanium and tungsten.

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ACT 930ACT® 930 etch residue remover and positive photoresist is a low hydroxylamine (HA) based product for aluminum applications. It is low cost and extremely effective in removing etch residue. It is well adopted in the worldwide semiconductor industry..

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ACT 935UPACT® 935 UP etch residue remover and positive photoresist remover is a highly effective Hydroxylamine‐containing etch residue and positive resist stripper. This product has gained acceptance in a wide range of applications throughout the acceptance in a wide range of applications throughout the semiconductor industry.

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