Trimethylphosphate Trimethylphosphate (TMPO) is a liquid phosphorus source used in depositing PSG and BPSG films for semiconductor applications. TMPO is a high purity liquid precursor used in producing high quality dielectric films.
Trimethylphosphite Trimethylphosphite (TMPI) is a liquid phosphorus source used with silicon sources such as TEOS to dope SiO2 in PSG and BPSG applications.
Trimethylsilane 3MS Semiconductor Semiconductor Grade Trimethylsilane (99.995%) is our standard high-purity offering for Low-k semiconductor applications. Trimethylsilane is a colorless, odorless, and highly-flammable gas.
Tungsten Hexafluoride Megaclass Tungsten Hexafluoride (WF6), Megaclass grade (99.9995%), is our highest purity grade for silicon semiconductor metallization process applications, offering full metals analysis. Tungsten Hexafluoride is a toxic, corrosive, odorless, liquefied gas.
TYPHOON™ S790 Quartzware Cleaner The Versum Materials TYPHOON Quartzware Cleaner is a self-contained system designed to automatically clean and rinse 200 or 300mm vertical furnace quartzware in a vertical all spray process. TYPHOON offers a faster and cleaner process with improved cost-of-ownership. The tool provides two process chambers with simultaneous independent operation.
VAPORGUARD Temperature Control System The VAPORGUARD® Temperature Control System is our next-generation controller that provides accurate and stable temperature control for chemicals. It is available in six different models (providing temperature control ranging from 10-115°C.)
Xenon DiFluoride Electronic Xenon Difluoride (XeF2) is a highly selective isotropic etching gas used in the MEMs market. Versum Materials offers a stable, low-cost supply of XeF2.
Yttrium Precursors Yttrium (Y) oxide is used in the High K dielectrics process as capping layers on other High K films, such as HfO2, or as stabilizers of crystalline forms of High K dielectrics, such as ZrO2.
Tetrakis Dimethylamino Titanium TDMAT Tetrakis-dimethylamino Titanium (TDMAT) is a liquid chemical source suitable for the chemical vapor deposition of titanium nitride films. TiN films are effective diffusion barriers for IC applications.