Arsine Megabit III Versum Materials offers two versions of Arsine gas (AsH3). Megabit III Grade Arsine (99.99995%) is our highest-purity grade for optoelectrical and photovoltaics applications, featuring full metals analysis.
ACT CMI-S ACT® CMI-S organic etch residue and positive photoresist stripper is a corrosion inhibited water‐soluble solution organic etch residue from corrosion‐sensitive metal alloy organic etch residue from corrosion‐sensitive metal alloy substrates. Solvent‐based, this product can be used in aluminum and advanced packaging applications.
ACT 915A ACT® 915A etch residue remover is a highly effective hydroxylamine (HA) based product for aluminum clean applications. It is well adopted in the worldwide semiconductor industry.
ACT 935UP ACT® 935 UP etch residue remover and positive photoresist remover is a highly effective Hydroxylamine‐containing etch residue and positive resist stripper. This product has gained acceptance in a wide range of applications throughout the acceptance in a wide range of applications throughout the semiconductor industry.
ACT 970 ACT® 970 etch residue remover and positive photoresist stripper is an extremely effective amine‐based product for aluminum and copper applications.
ACT AS-65 ACT® AS-65 etch residue remover and positive photoresist stripper is a highly effective non‐hydroxylamine (HA) stripper used for photoresist stripping and residue removal in aluminum applications.