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ACT 935UP ACT® 935 UP etch residue remover and positive photoresist remover is a highly effective Hydroxylamine‐containing etch residue and positive resist stripper. This product has gained acceptance in a wide range of applications throughout the acceptance in a wide range of applications throughout the semiconductor industry.

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ACT 940 ACT® 940 etch residue remover and positive photoresist is a highly effective hydroxylamine (HA) based product for aluminum clean applications. It is extremely successful in removing etch residue while protecting exposed aluminum, titanium and tungsten.  It is well adopted by worldwide semiconductor foundries.

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ACT 970 ACT® 970 etch residue remover and positive photoresist stripper is an extremely effective amine‐based product for aluminum and copper applications.

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ACT 970T ACT® 970T etch residue remover and positive photoresist stripper is effective in removing refractory etch residue while protecting exposed copper. It was designed specifically for use on substrates where copper corrosion is of concern.

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ACT 412 ACT® 412 positive photoresist stripper is specially formulated for the effective removal of positive photoresist from Group III‐V compounds and metal alloy substrates.

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ACT 690S ACT® 690S etch residue remover and positive photoresist stripper is a solvent‐based product for stripping severely processed photoresist films and etch residues.

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ACT 690SX ACT® 690SX is an organic solvent-based blend that is very effective in removing severely processed photoresist films and etch residue over corrosive sensitive metals and alloys.

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ACT 927C ACT® 927C etch residue remover is a highly effective hydroxylamine (HA) product for aluminum clean applications. It is extremely (HA) product for aluminum clean applications. It is extremely successful in removing refractory etch residue while protecting exposed aluminum, titanium and tungsten.

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