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Dynastrip™ DL88 Multipurpose Photoresist RemoverDynastrip DL88 is a uniquely formulated photoresist removal product designed specifically for wafer level packaging (WLP) applications including flip-chip bumping, redistribution, and wafer level CSP.

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Flipstrip Multipurpose Photoresist RemoverFlipStrip is a uniquely formulated chemistry designed specifically for the removal of processed photoresists used in flip-chip bumping applications. It is effective in both electroplated solder and in-situ paste processes.

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Dynastrip™ AP7900A Multipurpose Photoresist RemoverDynastrip AP7900A is a uniquely formulated photoresist remover designed specifically for stripping thick photoresist used in wafer level packaging (WLP) applications including lead-free solder bumping, µ-bumping, and Cu pillar processes

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Dynaloy™ 7700 Multipurpose Photoresist RemoverDynaloy 7700 is a uniquely formulated photoresist remover designed specifically for removing thick resist (dry film or liquid) used in wafer level packaging (WLP) including lead-free solder bumping, m-bumping and Cu pillar processes.

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S-1088 Exhausted Line Rinse StationThe Versum Materials Model S-1088 is a self-contained, fully automatic system designed to clean stainless steel exhaust lines, and other FAB parts with a user programmable DIW and acid blend.

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S-1702 Etch Parts CleanerThe Versum Materials Model S-1702 is a self-contained, fully automatic system designed to acid etch and rinse quartz chambers, ceramic rings, shower heads and miscellaneous parts, using precise pre-programmed recipes. USER selectable acid spray and spray rinse cycles delivering uniform etching and complete rinsing.

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S-1087 Exhausted Work StationThe Versum Materials S-1087 Exhausted Work Station is a self-contained, manual work station is designed to perform part cleans and rinses in an exhausted environment. The sink is fitted with two (2) fixed sprays bars, which can be operated by pushing the “spray bar on” button. A pneumatically operated drain valve will allow the operator to fill or dump the…

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PH3 Phosphine ION‐X® Dopant Gas Storage and Delivery SystemVersum Materials and NuMat Technologies announce a global alliance to bring ION‐X sub‐atmospheric dopant gas storage and delivery system solutions to our worldwide customers. ION-X  is used for the safe storage and delivery of sub-atmospheric dopant gases such as arsine, phosphine and boron trifluoride. With its Metal-Organic Framework (MOF), ION-X can selectively adsorb, store and safely deliver ultra-high purity gases at…

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QMAC® Quality Monitoring and Control Analytical SystemDeveloped for Ultra-High Purity Gases and Distribution Systems, the Versum Materials QMAC Quality Monitoring and Control Analytical System is a proven solution to enable successful semiconductor manufacturing by monitoring bulk and specialty gases impurities. The QMAC® Quality Monitoring and Control Analytical System integrates ultra-high purity analyzers to effectively sample ultra-high purity gases, such as nitrogen, oxygen, argon, helium and hydrogen.…

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Airopak® F2/N2 10% Fluorine in Nitrogen Mixture – Commercial GradeVersum Materials has a long history as the world’s leading provider of Airopak® fluorine gas mixtures for surface modification of plastics and fluoropolymers. Airopak F2/N2 mixtures create barrier properties or alter surface activation of the treated plastic surfaces. Versum Materials supplies 10% and 20% fluorine nitrogen (F2/N2) gas mixtures in individual cylinders and bulk tube trailers globally. Our expert technical…

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