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ACT 690SXACT® 690SX is an organic solvent-based blend that is very effective in removing severely processed photoresist films and etch residue over corrosive sensitive metals and alloys.

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ACT 927CACT® 927C etch residue remover is a highly effective hydroxylamine (HA) product for aluminum clean applications. It is extremely (HA) product for aluminum clean applications. It is extremely successful in removing refractory etch residue while protecting exposed aluminum, titanium and tungsten.

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ACT 930ACT® 930 etch residue remover and positive photoresist is a low hydroxylamine (HA) based product for aluminum applications. It is low cost and extremely effective in removing etch residue. It is well adopted in the worldwide semiconductor industry..

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ACT 935UPACT® 935 UP etch residue remover and positive photoresist remover is a highly effective Hydroxylamine‐containing etch residue and positive resist stripper. This product has gained acceptance in a wide range of applications throughout the acceptance in a wide range of applications throughout the semiconductor industry.

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ACT 940ACT® 940 etch residue remover and positive photoresist is a highly effective hydroxylamine (HA) based product for aluminum clean applications. It is extremely successful in removing etch residue while protecting exposed aluminum, titanium and tungsten.  It is well adopted by worldwide semiconductor foundries.

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ACT 970ACT® 970 etch residue remover and positive photoresist stripper is an extremely effective amine‐based product for aluminum and copper applications.

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ACT 970TACT® 970T etch residue remover and positive photoresist stripper is effective in removing refractory etch residue while protecting exposed copper. It was designed specifically for use on substrates where copper corrosion is of concern.

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