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Arsine Megabit Versum Materials offers two versions of Arsine gas (AsH3). Megabit Grade Arsine (99.9999%) is our standard high-purity grade for optoelectrical and photovoltaic applications.

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ACT NE-111 ACT® NE-111 etch residue remover is a buffered, pH stable fluoride‐containing stripper specifically formulated for removal of highly‐oxidized etch residues while reducing surface metal contamination. This product can be used in aluminum and copper applications.

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Arsine Megabit III Versum Materials offers two versions of Arsine gas (AsH3). Megabit III Grade Arsine (99.99995%) is our highest-purity grade for optoelectrical and photovoltaics applications, featuring full metals analysis.

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ACT NE14 ACT® NE-14 etch residue remover and positive photoresist stripper is a fluoride–containing chemistry specially formulated for removal of organic and highly oxidized etch residues and/or for controlled etching of contaminated oxide surfaces, including through‐silicon vias and sidewalls. This product can be used in aluminum and copper applications.

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ACT NE89 ACT® NE-89 etch residue remover is a fluoride‐containing chemistry specifically formulated for use in etch residue removal and/or controlled etching of contaminated oxide surfaces. This product was designed specifically for single wafer tool processing.

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ACT XT-1100 ACT XT-1100 etch residue remover and positive photoresist stripper is a fluoride‐containing chemistry formulated for removal of organic and highly oxidized etch residues. ACT XT‐1100 quickly and effectively removes etch residue and positive photoresist quickly and effectively removes etch residue and positive photoresist with minimal change on the critical dimensions of vias, metal lines, and trenches due to low oxide…

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Advanced Titanium Precursors Versum Materials offers a series of advanced Ti precursors for Thin Film Deposition of High K and Ultra High K dielectric films. These closely related compounds allow you to tailor the precursor to suit your processing requirements by selecting for properties such as Thin Film Deposition temperature, Thin Film Deposition rate, vapor pressure, etc. These precursors represent a technological advance…

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Ammonia (VLSI) Ammonia (NH3) VLSI is a high-purity grade for opto-electronic, RF and Power applications. For the LED/Compound Semiconductor market, we sell both White Ammonia and Blue Ammonia, in addition to our VLSI grade Ammonia offering.

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Ammonia (Blue) Ammonia (NH3) is a high-purity grade for opto-electronic, RF and Power applications. For the LED/Compound Semiconductor market, we sell both White Ammonia and Blue Ammonia, in addition to our VLSI grade Ammonia offering.

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Ammonia (White) Ammonia (NH3) is a high-purity grade for opto-electronic, RF and Power applications. For the LED/Compound Semiconductor market, we sell both White Ammonia and Blue Ammonia, in addition to our VLSI grade Ammonia offering.

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