ACT 940 ACT® 940 etch residue remover and positive photoresist is a highly effective hydroxylamine (HA) based product for aluminum clean applications. It is extremely successful in removing etch residue while protecting exposed aluminum, titanium and tungsten. It is well adopted by worldwide semiconductor foundries.
ACT 970 ACT® 970 etch residue remover and positive photoresist stripper is an extremely effective amine‐based product for aluminum and copper applications.
ACT 970T ACT® 970T etch residue remover and positive photoresist stripper is effective in removing refractory etch residue while protecting exposed copper. It was designed specifically for use on substrates where copper corrosion is of concern.