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Versum Materials to Exhibit Materials and Delivery Systems for Semiconductor Manufacturing at SEMICON Taiwan TEMPE, Ariz. (September 6, 2017) ‒ Versum Materials, Inc. (NYSE: VSM), Versum Materials, Inc. (NYSE: VSM), a leading materials supplier to the semiconductor industry, announced today it will showcase its next-generation CMP slurries, ultra-thin dielectric and metal film precursors, formulated cleans and etching products, and delivery equipment at the largest microelectronics event in Taiwan, SEMICON Taiwan. The event takes place…

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Versum Materials to exhibit materials and delivery systems for semiconductor manufacturing at SEMICON China TEMPE, Ariz. (March 9, 2017) ‒ Versum Materials, Inc. (NYSE: VSM), a leading materials supplier to the semiconductor industry, announced today it will showcase its next-generation CMP slurries, ultra-thin dielectric and metal film precursors, formulated cleans and etching products, and delivery equipment at the largest gathering of the semiconductor industry in the world, SEMICON China. The event takes place March…

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ACT CMIK-S ACT® CMIK-S positive photoresist stripper is a proprietary formulation specifically designed for effective positive photoresist stripping and residue removal from highly corrosion-sensitive metals and metal alloy substrates. Solvent-based, this product can be used for aluminum and advanced packaging applications.

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ACT EZSTRIP-20 ACT® EZSTRIP® 20 etch residue remover and positive photoresist stripper is a highly‐effective non‐hydroxylamine (HA) amine residue remover with the cleaning performance of HA‐containing products. This product can be used in aluminum applications.

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ACT EZSTRIP-528H ACT® EZSTRIP® 528H post‐etch residue remover is fluoride‐containing product specially formulated for effective removal of post‐etch and ash residue. Designed to be an aggressive cleaner in mild process conditions, this product can be used in aluminum and copper applications.

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ACT NE-111 ACT® NE-111 etch residue remover is a buffered, pH stable fluoride‐containing stripper specifically formulated for removal of highly‐oxidized etch residues while reducing surface metal contamination. This product can be used in aluminum and copper applications.

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ACT NE14 ACT® NE-14 etch residue remover and positive photoresist stripper is a fluoride–containing chemistry specially formulated for removal of organic and highly oxidized etch residues and/or for controlled etching of contaminated oxide surfaces, including through‐silicon vias and sidewalls. This product can be used in aluminum and copper applications.

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ACT NE-200 ACT® NE-200 etch residue remover is a fluoride‐containing product especially formulated for removal of inorganic and highly oxidized etch residues and/or for controlled etching of contaminated oxide surfaces.

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ACT NE89 ACT® NE-89 etch residue remover is a fluoride‐containing chemistry specifically formulated for use in etch residue removal and/or controlled etching of contaminated oxide surfaces. This product was designed specifically for single wafer tool processing.

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ACT XT-1100 ACT XT-1100 etch residue remover and positive photoresist stripper is a fluoride‐containing chemistry formulated for removal of organic and highly oxidized etch residues. ACT XT‐1100 quickly and effectively removes etch residue and positive photoresist quickly and effectively removes etch residue and positive photoresist with minimal change on the critical dimensions of vias, metal lines, and trenches due to low oxide…

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