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ACT CMI-S ACT® CMI-S organic etch residue and positive photoresist stripper is a corrosion inhibited water‐soluble solution organic etch residue from corrosion‐sensitive metal alloy organic etch residue from corrosion‐sensitive metal alloy substrates. Solvent‐based, this product can be used in aluminum and advanced packaging applications.

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ACT CMIK-S ACT® CMIK-S positive photoresist stripper is a proprietary formulation specifically designed for effective positive photoresist stripping and residue removal from highly corrosion-sensitive metals and metal alloy substrates. Solvent-based, this product can be used for aluminum and advanced packaging applications.

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ACT EZSTRIP-20 ACT® EZSTRIP® 20 etch residue remover and positive photoresist stripper is a highly‐effective non‐hydroxylamine (HA) amine residue remover with the cleaning performance of HA‐containing products. This product can be used in aluminum applications.

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ACT EZSTRIP-528H ACT® EZSTRIP® 528H post‐etch residue remover is fluoride‐containing product specially formulated for effective removal of post‐etch and ash residue. Designed to be an aggressive cleaner in mild process conditions, this product can be used in aluminum and copper applications.

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ACT NE-111 ACT® NE-111 etch residue remover is a buffered, pH stable fluoride‐containing stripper specifically formulated for removal of highly‐oxidized etch residues while reducing surface metal contamination. This product can be used in aluminum and copper applications.

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ACT NE14 ACT® NE-14 etch residue remover and positive photoresist stripper is a fluoride–containing chemistry specially formulated for removal of organic and highly oxidized etch residues and/or for controlled etching of contaminated oxide surfaces, including through‐silicon vias and sidewalls. This product can be used in aluminum and copper applications.

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ACT NE-200 ACT® NE-200 etch residue remover is a fluoride‐containing product especially formulated for removal of inorganic and highly oxidized etch residues and/or for controlled etching of contaminated oxide surfaces.

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ACT NE89 ACT® NE-89 etch residue remover is a fluoride‐containing chemistry specifically formulated for use in etch residue removal and/or controlled etching of contaminated oxide surfaces. This product was designed specifically for single wafer tool processing.

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ACT XT-1100 ACT XT-1100 etch residue remover and positive photoresist stripper is a fluoride‐containing chemistry formulated for removal of organic and highly oxidized etch residues. ACT XT‐1100 quickly and effectively removes etch residue and positive photoresist quickly and effectively removes etch residue and positive photoresist with minimal change on the critical dimensions of vias, metal lines, and trenches due to low oxide…

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ACT 410 ACT® 410 positive photoresist stripper is specially formulated for stripping hard‐to‐remove positive photoresist, including UV-cured resist and organic etch residue with minimal impact on the critical dimensions of vias and metal lines due to low oxide and metal etch rates.

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