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etch residue Archive

ACT NE-111 ACT® NE-111 etch residue remover is a buffered, pH stable fluoride‐containing stripper specifically formulated for removal of highly‐oxidized etch residues while reducing surface metal contamination. This product can be used in aluminum and copper applications.

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ACT NE-200 ACT® NE-200 etch residue remover is a fluoride‐containing product especially formulated for removal of inorganic and highly oxidized etch residues and/or for controlled etching of contaminated oxide surfaces.

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ACT NE89 ACT® NE-89 etch residue remover is a fluoride‐containing chemistry specifically formulated for use in etch residue removal and/or controlled etching of contaminated oxide surfaces. This product was designed specifically for single wafer tool processing.

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ACT 690S ACT® 690S etch residue remover and positive photoresist stripper is a solvent‐based product for stripping severely processed photoresist films and etch residues.

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ACT 690SX ACT® 690SX is an organic solvent-based blend that is very effective in removing severely processed photoresist films and etch residue over corrosive sensitive metals and alloys.

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ACT 930 ACT® 930 etch residue remover and positive photoresist is a low hydroxylamine (HA) based product for aluminum applications. It is low cost and extremely effective in removing etch residue. It is well adopted in the worldwide semiconductor industry..

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ACT 940 ACT® 940 etch residue remover and positive photoresist is a highly effective hydroxylamine (HA) based product for aluminum clean applications. It is extremely successful in removing etch residue while protecting exposed aluminum, titanium and tungsten.  It is well adopted by worldwide semiconductor foundries.

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ACT 970T ACT® 970T etch residue remover and positive photoresist stripper is effective in removing refractory etch residue while protecting exposed copper. It was designed specifically for use on substrates where copper corrosion is of concern.

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ACT AS-65 ACT® ACT AS-65 etch residue remover and positive photoresist stripper is a highly effective non‐hydroxylamine (HA) stripper used for photoresist stripping and residue removal in aluminum applications.

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ACT 410 ACT® 410 positive photoresist stripper is specially formulated for stripping hard‐to‐remove positive photoresist, including UV-cured resist and organic etch residue with minimal impact on the critical dimensions of vias and metal lines due to low oxide and metal etch rates.

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