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photoresist Archive

Propylene Electronic Propylene (C3H6) is a gas used for building up the Amorphous Carbon Layer (ACL), which works as a hardmask to support photoresist in the etching process.

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BPS-169 BPS-169 positive photoresist remover is an organic solvent blend which is particularly effective in removing severely processed photoresist films and etch residue over corrosion sensitive metals and alloys.

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ACT CMI-S ACT® CMI-S organic etch residue and positive photoresist stripper is a corrosion inhibited water‐soluble solution organic etch residue from corrosion‐sensitive metal alloy organic etch residue from corrosion‐sensitive metal alloy substrates. Solvent‐based, this product can be used in aluminum and advanced packaging applications.

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ACT 690S ACT® 690S etch residue remover and positive photoresist stripper is a solvent‐based product for stripping severely processed photoresist films and etch residues.

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ACT 690SX ACT® 690SX is an organic solvent-based blend that is very effective in removing severely processed photoresist films and etch residue over corrosive sensitive metals and alloys.

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ACT AS-65 ACT® AS-65 etch residue remover and positive photoresist stripper is a highly effective non‐hydroxylamine (HA) stripper used for photoresist stripping and residue removal in aluminum applications.

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