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CHEMGUARD® Gen III Model CG350 Automated Chemical Refill System W/Opt. eV Heating NEW: The 3rd Generation of the CHEMGUARD is here! The CHEMGUARD CG350 is a dual tank liquid refill (DTLR) cabinet designed for maximum uptime and to meet the demanding needs of today’s manufacturing fabs. CHEMGUARD has a reduced footprint of 457mm (18 in.) by 533 mm (21 in.), allowing for multiple cabinet placement directly adjacent to each other. This maximizes…

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Versum Materials Reaches Milestone with Installation of 200th CHEMGUARD® Gen. III Refill System TEMPE, Ariz. (January 6, 2017) – Versum Materials, Inc. (NYSE:VSM) The Delivery Systems and Services Group (DS&S) of Versum Materials, Inc. (NYSE: VSM) has realized an important milestone: the sale and commissioning of its 200th CHEMGUARD® Gen III high purity, liquid delivery system since the product line launched in early 2016. The 200 units are now running in the latest…

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Trimethylphosphate Trimethylphosphate (TMPO) is a liquid phosphorus source used in depositing PSG and BPSG films for semiconductor applications. TMPO is a high purity liquid precursor used in producing high quality dielectric films.

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Trimethylphosphite Trimethylphosphite (TMPI) is a liquid phosphorus source used with silicon sources such as TEOS to dope SiO2 in PSG and BPSG applications.

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Trimethylsilane 3MS Semiconductor Semiconductor Grade Trimethylsilane (99.995%) is our standard high-purity offering for Low-k semiconductor applications. Trimethylsilane is a colorless, odorless, and highly-flammable gas.

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VAPORGUARD Temperature Control System The VAPORGUARD® Temperature Control System is our next-generation controller that provides accurate and stable temperature control for chemicals. It is available in six different models (providing temperature control ranging from 10-115°C.)

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Titanium Tetrachloride TiCl4 Titanium Tetrachloride (TiCl4) is a liquid source material for the chemical vapor Thin Film Deposition (CVD) of titanium nitride, titanium dioxide and titanium metal.

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Trans-LC® Trans-LC (Trans 1,2-Dichloroethylene) is an ozone-safe liquid chlorine source for use in silicon oxidation and tube cleaning. It features a low toxic hazard rating and is not restricted as an ozone depleting chemical. Trans-LC provides consistent process results and is superior in performance to corrosive HCl. The use of Trans-LC is preferred over any known chlorine sources in the low-temperature…

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Triethylborate Triethylborate (TEB) is a liquid boron source used for Borosilicate (BSG) and Borophosphosilicate (BPSG) glass Thin Film Deposition in low pressure, atmospheric pressure and plasma enhanced CVD systems

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Triethylphosphate Triethylphosphate (TEPO) is a liquid phosphorus source used in depositing PSG and BPSG films for semiconductor applications.

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