Open Mobile Navigation

stripper Archive

BPS-169 BPS-169 positive photoresist remover is an organic solvent blend which is particularly effective in removing severely processed photoresist films and etch residue over corrosion sensitive metals and alloys.

View Product

ACT NE-111 ACT® NE-111 etch residue remover is a buffered, pH stable fluoride‐containing stripper specifically formulated for removal of highly‐oxidized etch residues while reducing surface metal contamination. This product can be used in aluminum and copper applications.

View Product

ACT 915A ACT® 915A etch residue remover is a highly effective hydroxylamine (HA) based product for aluminum clean applications. It is well adopted in the worldwide semiconductor industry.

View Product

ACT 927C ACT® 927C etch residue remover is a highly effective hydroxylamine (HA) product for aluminum clean applications. It is extremely (HA) product for aluminum clean applications. It is extremely successful in removing refractory etch residue while protecting exposed aluminum, titanium and tungsten.

View Product

ACT 930 ACT® 930 etch residue remover and positive photoresist is a low hydroxylamine (HA) based product for aluminum applications. It is low cost and extremely effective in removing etch residue. It is well adopted in the worldwide semiconductor industry..

View Product

ACT 935UP ACT® 935 UP etch residue remover and positive photoresist remover is a highly effective Hydroxylamine‐containing etch residue and positive resist stripper. This product has gained acceptance in a wide range of applications throughout the acceptance in a wide range of applications throughout the semiconductor industry.

View Product

ACT 940 ACT® 940 etch residue remover and positive photoresist is a highly effective hydroxylamine (HA) based product for aluminum clean applications. It is extremely successful in removing etch residue while protecting exposed aluminum, titanium and tungsten.  It is well adopted by worldwide semiconductor foundries.

View Product

ACT 970 ACT® 970 etch residue remover and positive photoresist stripper is an extremely effective amine‐based product for aluminum and copper applications.

View Product

ACT AS-65 ACT® ACT AS-65 etch residue remover and positive photoresist stripper is a highly effective non‐hydroxylamine (HA) stripper used for photoresist stripping and residue removal in aluminum applications.

View Product

ACT 410 ACT® 410 positive photoresist stripper is specially formulated for stripping hard‐to‐remove positive photoresist, including UV-cured resist and organic etch residue with minimal impact on the critical dimensions of vias and metal lines due to low oxide and metal etch rates.

View Product